JPH0338730B2 - - Google Patents

Info

Publication number
JPH0338730B2
JPH0338730B2 JP56145713A JP14571381A JPH0338730B2 JP H0338730 B2 JPH0338730 B2 JP H0338730B2 JP 56145713 A JP56145713 A JP 56145713A JP 14571381 A JP14571381 A JP 14571381A JP H0338730 B2 JPH0338730 B2 JP H0338730B2
Authority
JP
Japan
Prior art keywords
electrode
electrodes
reaction chamber
thin film
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56145713A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5848416A (ja
Inventor
Hiroshi Haruki
Hirobumi Fujisawa
Shinji Nishiura
Yukio Takeda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Fuji Electric Corporate Research and Development Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd, Fuji Electric Corporate Research and Development Ltd filed Critical Fuji Electric Co Ltd
Priority to JP56145713A priority Critical patent/JPS5848416A/ja
Publication of JPS5848416A publication Critical patent/JPS5848416A/ja
Publication of JPH0338730B2 publication Critical patent/JPH0338730B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/02521—Materials
    • H01L21/02524—Group 14 semiconducting materials
    • H01L21/02532—Silicon, silicon germanium, germanium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/0262—Reduction or decomposition of gaseous compounds, e.g. CVD

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Photovoltaic Devices (AREA)
JP56145713A 1981-09-16 1981-09-16 量産型薄膜生成装置 Granted JPS5848416A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56145713A JPS5848416A (ja) 1981-09-16 1981-09-16 量産型薄膜生成装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56145713A JPS5848416A (ja) 1981-09-16 1981-09-16 量産型薄膜生成装置

Publications (2)

Publication Number Publication Date
JPS5848416A JPS5848416A (ja) 1983-03-22
JPH0338730B2 true JPH0338730B2 (en]) 1991-06-11

Family

ID=15391397

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56145713A Granted JPS5848416A (ja) 1981-09-16 1981-09-16 量産型薄膜生成装置

Country Status (1)

Country Link
JP (1) JPS5848416A (en])

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4423701A (en) * 1982-03-29 1984-01-03 Energy Conversion Devices, Inc. Glow discharge deposition apparatus including a non-horizontally disposed cathode
JPH0719750B2 (ja) * 1984-06-22 1995-03-06 鐘淵化学工業株式会社 グロ−放電型成膜装置
JPH0719751B2 (ja) * 1984-07-02 1995-03-06 鐘淵化学工業株式会社 成膜方法
NL1022489C2 (nl) * 2003-01-24 2004-07-28 Stichting Energie Koppelinrichting voor dunnefilm fotovoltaïsche cellen.

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53112066A (en) * 1977-03-11 1978-09-30 Fujitsu Ltd Plasma treatment apparatus
JPS5729309Y2 (en]) * 1977-03-30 1982-06-26

Also Published As

Publication number Publication date
JPS5848416A (ja) 1983-03-22

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